5 results
Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K5.1
- Print publication:
- 2001
-
- Article
- Export citation
Molybdenum Gate Electrode Technology For Deep Sub-Micron CMOS Generations
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K5.2
- Print publication:
- 2001
-
- Article
- Export citation
Molybdenum as a Gate Electrode for Deep Sub-Micron CMOS Technology
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 611 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, C3.2.1
- Print publication:
- 2000
-
- Article
- Export citation
Competitive Oxidation During Buried Oxide Formation Using Separation by Plasma Implantation of Oxygen (Spimox)
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 388 / 1995
- Published online by Cambridge University Press:
- 21 February 2011, 385
- Print publication:
- 1995
-
- Article
- Export citation
Circuit Reliability Simulation
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 391 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 3
- Print publication:
- 1995
-
- Article
- Export citation